Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates | The Journal of Physical Chemistry C
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Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates | The Journal of Physical Chemistry C
![Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates | The Journal of Physical Chemistry C Examination of Etching Agent and Etching Mechanism on Femotosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates | The Journal of Physical Chemistry C](https://pubs.acs.org/cms/10.1021/jp900915r/asset/images/large/jp-2009-00915r_0006.jpeg)